Magnetron Sputtering


Magnetron sputtering technology makes it possible to coat target materials onto various substrates with a nanometer thickness accuracy.

Basically a vacuum enviroment with gases such as Argon and Nitrogen are form plasma between the substrate and target material therefore this plasma causes target material atoms to migrate onto surface of substrates.

Since plasma can be formed by magnetic fields, very strong magnets are used to direct and concentrate plasma onto substrate material.

In general; high energy gas atoms kicks the target material so hard that substrate became covered with target material.

OC3 AG uses in line scientific measurements to control thin film production in atomic level.

Latest News
What’s happening at OC3 AG
  • Solarion AG have been acquired by OC3 AG

  • OC3 AG is aiming to become energy oriented technology leader in Europe with its solar applications

  • OC3 AG will reach 40MW/year capacity by the end of 2016

  • Solarion brand is getting a facelift


OUR TECHNOLOGY
Energy oriented solutions
  • Thin Film Technology

    OC3 AG has been working on thin film technology to develop cutting edge solar cells and many other semi conductor products.

  • Thermal evaporation

    Thermal Evaporation is used for coating metallic materials onto various types of substrates with highest purity.

  • Magnetron Sputtering

    Magnetron sputtering technology makes it possible to coat target materials onto various substrates with a nanometer thickness accuracy.

  • State of the art CIGS

    Our innovative cigs technology provides exceptional reliability and durability and ensures a safe capital return.